Ytterbium Doped Laser Mirrors

Intended for the fundamental and second harmonic of Ytterbium (Yb) doped lasers, these mirrors reflect over 99.5% from 505-530 nm and/or 1020-1050 nm. They feature a proprietary low-Group Delay Dispersion (GDD) coating. Designed to steer ultrashort pulses at 45° AOI with minimal effect on pulse dispersion, these mirrors are ideal for use with Spectra-Physics ultrafast lasers such as the Spirit® high power femtosecond laser.

Proprietary low GDD coating design
Designed for the fundamental and second harmonic
R>99.5% @ single or dual wavelengths
Polished back surface allows transmission at other wavelengths
Fused silica substrate for low thermal expansion and absorption

See All Features

Description	Compatibility	Price
10QM20UF.DF55 Ytterbium Doped Ultrafast MirrorsLow GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 505-530 nm and 1020-1050 nm	UNIVERSAL	$323
10QM20UF.F15 Ytterbium Doped Ultrafast MirrorsLow GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 1020-1050 nm	UNIVERSAL	$271
10QM20UF.F55 Ytterbium Doped Ultrafast MirrorsLow GDD Mirror, Ytterbium Laser, 45° AOI, 25.4 mm, 505-530 nm	UNIVERSAL	$228

Specifications

Features

The Popular Ytterbium Doped Laser

There are many types of Ytterbium doped lasers ranging from the compact fiber lasers to high performance femtosecond lasers such as the Spirit® laser from Spectra-Physics. Applications include ablation, cutting, drilling, welding, marking, laser sintering, and eye surgery.

High Reflectivities For Single Ytterbium Wavelengths

High reflectivities are offered for popular Ytterbium wavelengths. The 10QM20UF.F15 and 10QM20UF.F55 offer R_s, R_p > 99.5% for 1020-1050 nm or 505-530 nm, respectively. All mirrors are made from high quality fused silica with multilayer dielectric coatings.

Dual Wavelength Mirror

The 10QM20UF.DF55, is a dual wavelength mirror reflecting both the fundamental and second harmonic. This mirror offers an average reflectivity (S+P)/2 polarization > 99.5%. All mirrors are made from high quality fused silica with multilayer dielectric coatings.

Fused Silica Substrates

Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.