Newport's ultrafast broadband turning mirrors reflect over 99.6% over the wide range of 680-1060 nm. They feature neutral Group Delay Dispersion (GDD) and low third order dispersion. Designed to minimize phase distortion when steering ultrashort pulses at 45° AOI, these mirrors are ideal for use with Spectra-Physics ultrafast lasers including the Mai Tai®, Spitfire® Ace™ and Tsunami®.
- Low phase distortion and neutral GDD
- R>99.6% @ 680-1060 nm for P- or S- polarization
- Optimized for 45° AOI for steering ultrafast laser beams
- Polished back surface allows transmission at other wavelengths See All Features
| Compare | Description | Drawings, CAD & Specs | Avail. | Price | ||
|---|---|---|---|---|---|---|
![]() | 10Q20UF.35P Broadband Ultrafast MirrorsTurning Mirror, Super-Broadband, Ultrafast, 25.4 mm, P Pol, 680-1060 nm | |||||
![]() | 10Q20UF.35S Broadband Ultrafast MirrorsTurning Mirror, Super-Broadband, Ultrafast, 25.4mm, S Pol, 680-1060nm | |||||
![]() | 20Q20UF.35P Broadband Ultrafast MirrorsTurning Mirror, Super-Broadband, Ultrafast, 50.8 mm, P Pol, 680-1060 nm | |||||
![]() | 20Q20UF.35S Broadband Ultrafast MirrorsTurning Mirror, Super-Broadband, Ultrafast, 50.8 mm, S Pol, 680-1060 nm |
Specifications
Features
Wide Spectral Bandwidth
Our Ultrafast Broadband Turning Mirrors are designed to steer beams at 45 degrees AOI with over 99.6% reflection across the wide 680nm to 1060nm wavelength range. The back surface of the mirror is polished to enable transmission of visible wavelengths in order to monitor relative power.
Minimal Effect on Pulse Dispersion
Careful thin film design and advanced coating processes result in a mirror with maximum reflectivity, maximum bandwidth and minimum effect on pulse dispersion. Minimizing phase distortion and neutral GDD across the tuning range, these mirrors are ideal for use with ultrafast lasers.
Slight Wedge to Suppress Interference Effects
Our ultrafast mirrors may be used as dichroic mirrors in pump probe laser applications. The mirrors have a 30 arc minute wedge angle to suppress interference fringes for the transmitted beam. Note that performance outside of the specified wavelength range cannot be guaranteed.
Two Photon Microscopy Applications
For Use With Spectra-Physics Lasers
Fused Silica Substrates
Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.
Resources
Selection Guides
Technical Notes
Literature
Ultrafast Laser Optics-White Paper(477.2 kB, PDF)















